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The only way out of that predicament is to keep reminding ourselves of what our real goals are, in their essential elements, and why we want them. As Chair, I want to make this Division relevant to you and your careers as well as to my own. The key to any professional society is the voluntary membership and their efforts to improve their professional standing in the community at large. We try to do that in the I&EC Division by providing forums for the exchange of important new information, networking with other professionals, and interacting with the American Chemical Society in developing policy positions for public consumption. We need each member, as always, to help in any way they can to promote our activities in your own self-interest. If it is no longer of interest to you, tell us why, and help us change that. If it is of interest, lend us your support by attending meetings, volunteering to help in one of the many committees required to maintain the Division, and just by encouraging other chemists and engineers to sign up for membership in our Division.
Exciting news from our last National meeting is a strengthening of the visibility and position of our three sub-divisions. Along with our general programming in leading technologies, you may be interested in concentrated programming efforts in Separations, Materials, or Green Chemistry topics. Interact on a more personal level with other scientists working in areas directly related to your interests and job relevance. As much of the world revels in the turn of the millennium, remember that our jobs and interests in the chemical sciences are more important that ever to the fulfillment of many of their dreams. It's going to be a great time to be working in this field. Being an active participant in the I&EC Division is going to be an exciting and fulfilling part of it.
Steven Cooke, Chair
The subdivision will also encourage research into all aspects of advanced materials and nanotechnology, and promote the development of interdisciplinary and international scientific collaborations in these areas. This will be fostered by having U.S. and European co-chairs and by identifying a liaison to the American Chemical Society and the Materials Research Society. The subdivision will provide a basis for continuing education in this field for chemists and related scientists (including students).
In addition, the subdivision will further public interest in nanotechnology and advanced materials and bring the importance of nanoscale science and technology and materials to the attention of the chemistry community at a strategic level. The subdivision plans to begin technical programming in the Fall 2000 ACS National Meeting (Washington, DC). For more information on how you can become involved contact Robert Haddon at haddon@pop.uky.edu.
For the past 30 years, lithography has been the key technological driving force that has enabled the remarkable growth in the semiconductor industry; through increased miniaturization, both improved device performance and reduced cost can be simultaneously achieved. Many technological fields outside the traditional arena of silicon-based microelectronic devices can accrue similar benefits through miniaturization, and there are now significant efforts to apply lithographic techniques in these areas, and to devise alternate methods for patterning that potentially offer advantages in simplicity, cost and flexibility. The goal of this symposium is to provide an overview of many of the new lithographic fabrication technologies and applications for an audience unfamiliar with these topics; in particular, the intent is to be accessible to students and younger chemists. To achieve this, we have structured the symposium to first establish the scientific and technological context for lithography with summaries of the states-of-the-art, and views of the future, for conventional lithographic technology, imaging materials and applications. This will be followed by overviews of emerging methods and applications of lithographic patterning from leading researchers in those fields. Descriptions of emerging applications will include recent work on molecular logic gates, micromachining and microtransducers, and biochips. Descriptions of emerging methods will polymer self-assembly, micromirror technology, proximal probe and near-field ithographies, soft lithography, nano-scale embossing, and templating.
A chemical company's supply chain is the critical link between suppliers and producers, and producers and customers. As the chemical industry becomes more globally competitive, issues related to efficient supply chain management, like customer-driven scheduling; low-cost material handling, transportation, and storage; and lean manufacturing-based inventory and work-in-progress management become more critical to a company's success. In addition, business strategies that consider supply chain capabilities; case studies in benchmarking, information systems integration, best factory judging, SixSigma implementation, and change management; and modeling and simulation that support improvements in supply chain effectiveness are beginning to yield some interesting directions for change. Technology Vision 2020: The U.S. Chemical Industry predicts that by identifying change opportunities and "best practices" for chemical industry supply chains, managers hold the potential to increase their process output by more than 30%, reduce inventories by as much as 50%, and reduce costs like transportation, storage, and spoilage by up to 50% - all for little or no capital investment. Corporation Associates representatives will hear summary presentations from three experts noted for their work in this area at the CA open meeting in San Francisco on Monday March 27th. Presenters are listed below.
Program Chairs: Ralph C Gatrone, NA, 5411-M Paddock Club Drive, Montgomery, AL 36116, (334) 286-3639, fax (334) 286-3639, e-mail: r.gatrone @worldnet.att.net; Dianna Phillips, Kettering University, SM Department, 1700 West Third Avenue, Flint, MI 48504-4898, (810) 762-9920, fax (810) 762-9796, e-mail: Dphillip@kettering.edu
Submit copy of abstract through Online abstract system (OASys) or by mailing one copy to symposium organizer.
Responsible Care. Nancy Jackson, Sandia National Laboratories, PO Box 5800, MS 1349, Albuquerque, NM 87185, (505) 272-7619, fax (505) 272-7336, e-mail: nbjacks@sandia.gov
Functional Nanostructures. Lawrence R. Sita, University of Maryland, Chemistry and Biochemistry, College Park, MD 20742, (301) 405-5753, fax (301) 314-9121, e-mail: ls214@umail.umd.edu
Emerging Technologies: Hazardous Waste Management. Daniel W. Tedder, Georgia Institute of Technology, Chemical Engineering, Atlanta, GA 30322-0100, (404) 894-2856, fax (404) 894-2866, e-mail: daniel.tedder@che.gatech.edu
Clean Solvents. Martin Abraham, University of Toledo, Chemical Engineering, Toledo, OH 43606, (419) 530-8092, e-mail: mabraham@eng.utoledo.edu; Luc Moens, National Renewable Energy Laboratory, Center for Chemistry of BioEnergy Systems, 1617 Cole Blvd, Golden, CO 80401-3393, (303) 384-6265, fax (303) 384-6103, e-mail: Luc_moens@nrel.gov
Green Chemistry: Applications in Academia and Industry. Tracy C. Williamson, USEPA, OPPT, 401 M Street SW, Washington, DC 20460, (202) 260-2659, fax (202) 260-0816, e-mail: williamson.tracy@epa.gov; Paul T. Anastas, USEPA, OPPT, 401 M Street SW, Washington, DC 20460, (202) 260-2659, fax (202) 260-0816, e-mail: anastas.paul@epa.gov; Mary Kirchhoff, USEPA, OPPT, 401 M Street SW, Washington, DC 20460, (202) 260-1551, fax (202) 260-0816, e-mail: kirchhoff.mary@epa.gov
General Poster Session. Andrew Bond, Argonne National Laboratory, Chemistry, Argonne, IL 60439, (630) 252-0957, fax (630) 252-7501, e-mail: ahbond@anl.gov
Membranes Gordon Conference
The Gordon Research Conference on Membranes: Materials and Processes will be held at Connecticut College in New London, CT from July 29-Aug. 3, 2000. The Conference Program is available at: http://www.grc.uri.edu/programs/2000/memmat.htm.
Participants can obtain an application form by accessing the Gordon Conferences web site at http://www.grc.uri.edu/
2000 International Chemical Congress of Pacific Basin Societies
Chemists and chemical engineers in countries bordering the Pacific Ocean and in all other countries are invited to submit papers for consideration and to attend the 2000 International Chemical Congress of Pacific Basin Societies. Scheduled for 14-19 December 2000, in Honolulu, Hawaii, USA, it is being cosponsored by the American Chemical Society, Chemical Society of Japan, the Canadian Society for Chemistry, the New Zealand Institute of Chemistry and the Royal Australian Chemical Institute. Many of the Chemical Societies in the countries that border the Pacific Ocean are Official Participating Organizations. Papers will be presented in symposia and in general oral and poster sessions in the 10 topical areas in which symposia are grouped (see web site for list). A few selected symposia will be for invited papers only. An abstract of approximately 150 words must be submitted for each contributed paper. The Congress abstract form is available for electronic retrieval and submission from the Pacifichem 2000 web site at: http://www.acs.org/meetings/pacific2000. Paper forms can be obtained by contacting the Congress Secretariat. The deadline for invited or contributed abstracts in paper format will be April 3. The deadline for abstracts submitted electronically will be April 14.
I am also on the DAC subcommittee reviewing secretariat guidelines, and have passed many questions along to our division leadership for their chance to provide input. I think the I&EC's concerns with secretariats operation are merited, but they are not as problematical for us as once thought. The DAC will be making recommendations for revised secretariat guidelines in an attempt to bring some commonality to all of them, but this may not be completely successful. They are a loose association of their own member divisions' representatives, so loose in fact that of the four secretariats none could name all their member divisions.
For the fall 1999 ACS meeting in New Orleans I co-organized a symposium "Issues Facing Women Professionals" with Deborah Carter from Pace International. The symposium had 12 speakers from industry, academia and government, as well as one non-scientist, and was co-sponsored by the Women Chemists Committee (WCC) and the Younger Chemists Committee (YCC). Topics included a futuristic look at the workforce, international travel and assignments with trailing spouses, working in sales, balancing academic or industrial careers and family, finding jobs on the internet, and the new non-traditional careers blending disparate fields like business and physics, or chemistry and law. Attendance was respectable, and the material was valuable and interesting to both male and female audience.
I continue to serve on the editorial board of "Chemistry," which combined the two older ACS publications "Reaction Times," geared toward college students, and "ACCESS," targeted toward ACS members. The articles have continued to be interesting and timely, informative to the students while giving ACS members a chance to sample chemistry fields other than their own. The editorial board meets at each ACS meeting, and by conference calls and e-mail.
Thank you for your continued support in electing me to another term. I appreciate your comments and feedback at any time. I can be reached most conveniently by e-mail at leskom@tamug.tamu.edu.
President Ed Wasserman sponsored three Presidential Events at the meeting; on SUN AM, a 7 paper symposium predicting the impact of Food Chemistry in the 21st century and the 3rd millennium; SUN PM, a 5 paper session, organized by I&EC Past-Chair Nancy Jackson on "Visions of Materials", exploring the world of self-assembled materials; and finally, on SUN PM (5:30-7:00) a Presidential Reception celebrating the 25th anniversary of the Younger Chemists Committee entitled "Looking Back to the Future".
Council accepted a new plan for redistricting to more evenly distribute the numbers of members in regions. It also agreed to a new schedule of registration fees for national meetings that will ensure that the meetings break even over a five-year period. A Bylaw change was passed, making member's anniversary date the date of entry into the active membership roll. This will eliminate delays in processing new and reinstated members and reduce the backlog around the current quarterly start dates. We passed another Bylaw change refining and defining the conditions under which Divisions may enter into affiliations with other Technical Organizations.
Since the meeting the election has been held and Attila Pavlath triumphed in a close race over Alan Schriesheim, with only 18% of the more than 153,000 members voting. Pretty sad but not as bad as recent I&EC elections.
James D. Burke, manager of technical recruiting and university relations at Rohm and Haas, Spring House, Pa., and C. Gordon McCarty, retired manager of university relations at Bayer Corp., Pittsburgh, will serve their first 3-yr. terms as directors-at-large. They defeated incumbent Lura Powell, NIST and Valerie Kuck, Lucent Technologies. Pavlath, Powell and Kuck are members of I&EC.
I am now serving on the Committee for Technician Activities which is dealing with a wide range of concerns, problems and programs regarding chemical technicians and their relatively new Division of Chemical Technicians.
The Dept. of Career Services (DCS) continued to expand its services to the membership. The DCS, along with volunteer Career Consultants (CCs), conducted mock interview sessions and reviewed resumes, and the NECH, improved by computerized scheduling, allowed 1000 job seekers to have 3,049 interviews for 513 positions. I don't have the numbers for one-on-one resumes and mock interviews at the meeting but the 1999 year numbers are impressive. Over 1,000 members received one-on-one career assistance, including 541 resume reviews at national and regional meetings, 130 in house reviews, 226 mock interview sessions and 146 career consulting cases.
I had extra duty at the N.O. Mtg., having committed to managing the Graduate Student Award Luncheon and Ceremony. We had sought nominations from the Chemistry and Chemical Engineering Depts. at both LSU and Tulane and from the combind dept. at Univ. of N.O. Each department nominated their top graduate student who was planning a chemical career in industry. When the judging was over there was no clear-cut winner; they were all outstanding. We finally decided to give the Award, a one-year membership in the ACS, to each of them. The candidates and their mentors were entertained at a luncheon, overlooking the Mississippi. Many supporting members and guests applauded as our Chair, Robin Rogers performed flawlessly as host, presenting plaques to the Students and Certificates for the schools to the Mentors. The extra cost of five honorees instead of one was covered by additional support by institutional and private gifts. It was clear from the feedback that his event was highly successful and should be repeated. The Graduate Student Awards Committee is studying strategies for continuation.
I believe that I am detecting a groundswell of change amongst the various Divisions and their members. There seems to be a rush to get in on the challenges and rewards of programming to appeal to industrial types, witness the titles and industrial slant of symposia from non-applied divisions. Meanwhile, we in I&EC are striving to identify ourselves and focus our efforts. I believe we are getting the job done but we all need feedback from our loyal members. Getting involved is truly rewarding.
I promised last time to give you my definition of an industrial chemist or chemical engineer. To me it is fairly simple. Anyone with training or education in chemistry or chemical engineering and who is employed in industry is an industrial chemist or chemical engineer.
HELLO out there! Every once in awhile someone responds to these efforts to bring the highlights of the National Meeting to you and to the expressions of my take on sometimes controversial subjects. Thanks a lot - it warms my heart. Let me hear from you. What is your definition of an Industrial Chemist or Engineer? (New e-mail address: rstow@northlink.net. New phone area code: (231) 526-5078. Mail address: Box 173, 5680 Chippewa Dr., Cross Village, MI 49723).
In that regard, so far this year I have agreed to:
It is smart business to be informed about your exposures....And to transfer these risks to your insurer!
Sponsored By: Board of Trustees, Group Insurance Plans for ACS Members. For Information:Call the Plan Administrator, Bradley & Parker: 800-445-3393 or visit the ACS Member Insurance Web Site: http://www.acs.org/insurance
Past-chair
Robin Rogers
University of Alabama
Department of
Chemistry
Tuscaloosa, AL 35487
rdrogers@bama.ua.edu
Chair-elect
Dale Ensor
Department of Chemistry
Campus Box 5055
Tennessee Technological University
Cookeville, TN 38505
densor@tntech.edu
Secretary
Luis Nuñez
Argonne National Laboratories
Chemical Technology Division
9700 South Cass
Ave.
Argonne, IL 60439
nunez@cmt.anl.gov
Treasurer
Carol J. Mertz
Argonne National Laboratory
9700 South Cass Ave
Argonne, IL 60439
mertz@cmt.anl.gov
Councilors
Melanie Lesko
Texas A&M University
PO Box
1675
Galveston, TX 77553
leskom@tamug2.tamu.edu
John L. Massingill
Coatings Research Institute
430 West Forest
Ave.
Ypsilanti, MI 48197
john.massingill@emich.edu
Kathleen M. Schulz
Sandia National Laboratories
PO Box 5800
Albuquerque,
NM 87185
kmschul@sandia.gov
Robert A. Stowe
Retired, Dow Chemical
5680 Chippewa Drive
PO Box 173 Cross Village, MI 49723
rstow@NORTHLINK.NET
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Updated 16 September 2002