COLL 440 |
| Toshiyuki Watanabe, Youmei Lu, Fuyuki Hasegawa, Fumiko Chiba, Noriko Kimura, Mari Tsubouchi, and Kenro Totani. Department of Oraganic and Polymeric Material Systems Engineering, Tokyo University of Agriculture and Technology, 2-24-16 Nakacho, Koganei-shi, Tokyo, 184-8588, Japan |
| Recent progresses in mesoscopic pattern formation of polymers are reviewed from the view point of nanotechnology of bottom-up materials function. The radical photoinitiation characteristics of novel chromophores under two-photon excitation are reported. Photo-crosslinkable resins were formulated with these initiators and were used to fabricate a variety of complex three-dimensional structures by two-photon induced polymerization (TPIP). These structures illustrate that TPIP can be a highly versatile technique for the rapid single-step fabrication of complex microstructures and devices. The new two photon resins were found to be as much as 100 times more sensitive than resins containing conventional UV initiators. TPIP was applied to produce photonic crystals, photoresposive micromachine and elastic substrate for tissue engineering. |
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Colloidal and Molecular Electro-Optics
Division of Colloid and Surface Chemistry |